Plasma-Preen System Advantages

Simplicity of construction

  1. Ease of Operation
  2. Time average uniformity
  3. Higher power densities.
  4. Large flat surfaces available and greater heights.  (Up to 9 x 7" x 3"  [228mm x 177mm x 75mm for standard systems, larger special systems available])
  5. Duty cycle control allows for high power and lower process temperatures.
  6. Analog power control
  7. Water cooling allows for higher reaction rates at higher plasma power and faster reaction rates.
  8. Uniform processing temperature that leads to uniform reaction rates as reaction rates are an exponential function of temperature difference across wafer surfaces.